IR studies of reactive DC magnetron sputtered SiC films on silicon using effective medium theory

Materials Letters

Volumn 43, Issue 4, 2000, Pages 215-219

  Lei, Y M ^a   Yu, Y H ^a   Cheng, L L ^a   Ren, C X ^a   Zou, S C ^a   Wong, S P ^b   Chen, D H ^b   Wilson, I H ^b  

^a Shanghai Metallurgic Inst   (China)

^b CHINESE UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; BACKSCATTERING; COMPOSITION EFFECTS; COMPUTATIONAL METHODS; COMPUTER SIMULATION; MAGNETRON SPUTTERING; SEMICONDUCTOR DEVICE MODELS; SILICON CARBIDE; THIN FILMS;

EFFECTIVE MEDIUM THEORY (EMT); NON-RUTHERFORD BACKSCATTERING;

SEMICONDUCTING FILMS;

EID: 0033879359     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-577X(99)00262-1     Document Type: Article

References (11)

1. Glass R.C.et al. MRS Bull. 22:1997;30. (March).
2. Davis R.F. Thin Solid Films. 181:1989;1.
3. Fissel A., Schroter B., Richter W. Appl. Phys. Lett. 66:1995;3182.
4. Wahab Q., Hultman L., Ivanov I.P., Willander M., Sundgren J.-E. Thin Solid Films. 261:1995;317.
5. Wong S.P., Chen D., Ho L.C., Yan H., Kwok R.W.M. Nucl. Instr. and Meth. in Phys. Res. B. 140:1998;70.
6. Holm R.T., Klein P.H., Nordquist P.E.R. Jr. J. Appl. Phys. 60:1986;1479.
7. Chen Z.Y., Yu Y.H., Zhao J.P., Wang X., Liu X.H., Shi T.S. J. Appl. Phys. 83:1998;1281.
8. Okamoto Y., Ordin S.V., Kawahara T., Fedorov M.I., Miida Y., Miyakawa T. J. Appl. Phys. 85:1999;6728.
9. Y.M. Lei et al., submitted to Thin Solid Films.
10. SIMNRA version 4.4, copyright Max-Planck-Institut für Plasmaphysik, 1997, 1998.
11. Feng Y., Zhou Z., Zhou Y., Zhou G. Nucl. Instrum. Methods B. 86:1994;225.