CVD diamond: Controlling structure and morphology

Vacuum

Volumn 56, Issue 3, 2000, Pages 153-158

  Ahmed, W ^a   Rego, C A ^a   Cherry, R ^a   Afzal, A ^a   Ali, N ^a   Hassan, I U ^a  

^a MANCHESTER METROPOLITAN UNIVERSITY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; CHEMICAL VAPOR DEPOSITION; CRYSTAL MICROSTRUCTURE; CRYSTAL ORIENTATION; DOPING (ADDITIVES); ELECTRIC CONDUCTIVITY OF SOLIDS; FILM GROWTH; MORPHOLOGY; NITROGEN; NUCLEATION; PARTICLE SIZE ANALYSIS; SURFACE ROUGHNESS; AMORPHOUS FILMS; CUTTING TOOLS; DIAMOND FILMS; DIELECTRIC FILMS; MAGNETIC FILMS; MAGNETRON SPUTTERING; METALLIC FILMS; SPUTTER DEPOSITION; SURFACE TREATMENT; ULTRATHIN FILMS;

CRYSTALLITE SIZE;

DIAMOND FILMS; VACUUM TECHNOLOGY;

COBALT COPPER ALLOY; DIAMOND LIKE CARBON (DLC); EIREV; GATE VALVES; GIANT MAGNETORESISTANCE; GRANULAR ALLOY FILMS; ION BEAM ASSISTED DEPOSITION (IBAD); ION BEAM SPUTTERING; LEAD ZIRCONATE TITANATE; SURFACE ENGINEERING;

EID: 0033873953     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0042-207X(99)00147-5     Document Type: Article

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