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Volumn 39, Issue 3 A, 2000, Pages 1032-1034
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Characteristics of intermixed InGaAs/InGaAsP multi-quantum-well structure
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Author keywords
InGaAs InGaAsP multi quantum well; Optical waveguide; Photoluminescence; Quantum well intermixing; Secondary ion mass spectroscopy
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Indexed keywords
DEPOSITION;
DIELECTRIC FILMS;
ENERGY GAP;
HEAT TREATMENT;
OPTICAL WAVEGUIDES;
PHOTOLUMINESCENCE;
SECONDARY ION MASS SPECTROMETRY;
SEMICONDUCTING INDIUM GALLIUM ARSENIDE;
SEMICONDUCTOR DEVICE STRUCTURES;
SILICA;
PROPAGATION LOSS;
QUANTUM WELL INTERMIXING;
SEMICONDUCTING INDIUM GALLIUM ARSENIC PHOSPHIDE;
SEMICONDUCTOR QUANTUM WELLS;
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EID: 0033751761
PISSN: 00214922
EISSN: None
Source Type: Journal
DOI: 10.1143/jjap.39.1032 Document Type: Article |
Times cited : (14)
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References (16)
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