Calixarene and Dendrimer as Novel Photoresist Materials

ACS Symposium Series

Volumn 706, Issue , 1998, Pages 237-248

  Haba, Osamu ^a   Takahashi, Daisuke ^a   Haga, Kohji ^a   Sakai, Yoshimasa ^a   Nakayama, Tomonari ^a   Ueda, Mitsuru ^a  

^a YAMAGATA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0041913062     PISSN: 00976156     EISSN: None     Source Type: Book Series    
DOI: 10.1021/bk-1998-0706.ch018     Document Type: Article

References (12)

1. Willson, C. G., In Introduction to Microlithography 2nd ed.; Thompson, L. F.; Willson, C. G.; Bowden, M. J. Eds.; ACS: Washington DC, 1994, pp. 139.
2. Allen, R. D.; Rex Chen, K. J.; Gallagher-Wetmore, P. M. Proc. SPIE 1995, 2438, 250.
3. Fujita, J.; Ohnishi, Y.; Ochiai, Y.; Matsui, S. Appl. Phys. Lett. 1995, 68, 2438.
4. Gutsche, C. D. Aldrichimica Acta 1992, 28, 3.
5. Högberg, A. G. S. J. Org. Chem. 1980, 45, 4498.
6. Hawker, C. J.; Fréchet, J. M. J. J. Am. Chem. Soc. 1990, 112, 7638.
7. Crivello, J. V. In UV Curing: Science and Technology; Pappas, S. P. Ed.; Technology Marketing Corp.: Stanford, 1978; Chapter 2.
8. Wallraf, G. M.; Allen, R. D.; Hinsberg, W. D.; Willson, C. G.; Simpson, L. L.; Webber, S. E.; Sturterant, J. L. J. Imaging Sci. Technol. 1992, 36, 468.
9. Nitoh, K.; Yamaoka, T.; Umehara, A. Chem. Lett, 1991, 1869.
10. Nitoh, K.; Yamaoka, T.; Umehara, A. Polym. Adv. Technol. 1992, 3, 117.
11. Lee, S. M.; Fréchet, J. M. J.; Willson, C. G. Macromolecules 1994, 27, 5154.
12. Lee, S. M.; Fréchet, J. M. J. Macromolecules 1994, 27, 5160.