Calixarene Resists for Nanolithography

ACS Symposium Series

Volumn 706, Issue , 1998, Pages 249-261

  Ohnishi, Yoshitake ^a,b   Wamme, Naoko ^a,b   Fujita, Jun Ichi ^a  

^a NEC CORPORATION   (Japan)

^b NONE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0347876178     PISSN: 00976156     EISSN: None     Source Type: Book Series    
DOI: None     Document Type: Article

References (23)

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