Characterization of the secondary glow region of a biased microwave plasma by optical emission spectroscopy

Diamond and Related Materials

Volumn 9, Issue 3, 2000, Pages 305-310

  Whitfield, Michael D ^a   Foord, John S ^b   Savage, James A ^c   Jackman, Richard B ^a  

^a UNIVERSITY COLLEGE LONDON   (United Kingdom)

^b UNIVERSITY OF OXFORD   (United Kingdom)

^c DEFENCE SCIENCE AND TECHNOLOGY LABORATORY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC VARIABLES MEASUREMENT; EMISSION SPECTROSCOPY; ION BEAM LITHOGRAPHY; MICROWAVES; NUCLEATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SUBSTRATES;

BIAS-ENHANCED NUCLEATION (BEN); OPTICAL EMISSION SPECTROSCOPY (OES);

DIAMONDS;

EID: 0033728801     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(00)00237-5     Document Type: Article

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