Thermal conductance measurements of a silicon nitride membrane at low temperatures

Physica B: Condensed Matter

Volumn 284-288, Issue PART II, 2000, Pages 1968-1969

  Woodcraft, Adam L ^a   Sudiwala, Rashmi V ^a   Wakui, Elley ^a   Bhatia, Ravinder S ^b   Bock, James J ^c   Turner, Anthony D ^c  

^a QUEEN MARY UNIVERSITY OF LONDON   (United Kingdom)

^b CALIFORNIA INSTITUTE OF TECHNOLOGY   (United States)

^c CALIFORNIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

Cryogenic instrumentation; Thermal conduction; Thin films

Indexed keywords

EID: 0033721209     PISSN: 09214526     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-4526(99)02925-7     Document Type: Article

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