Analysis of cadmium diffusion in ZnSe by X-ray diffraction and transmission electron microscopy

Journal of Crystal Growth

Volumn 214, Issue , 2000, Pages 585-589

  Heinke, H ^a   Passow, T ^a   Stockmann, A ^a   Selke, H ^a   Leonardi, K ^a   Hommel, D ^a  

^a UNIVERSITY OF BREMEN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFUSION IN SOLIDS; MOLECULAR BEAM EPITAXY; SEGREGATION (METALLOGRAPHY); SEMICONDUCTING CADMIUM COMPOUNDS; SEMICONDUCTING GALLIUM ARSENIDE; SEMICONDUCTING ZINC COMPOUNDS; TEMPERATURE; THICKNESS MEASUREMENT; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

CADMIUM SELENIDE; HIGH RESOLUTION XRAY DIFFRACTION; SURFACE SEGREGATION; ZINC SELENIDE;

SEMICONDUCTOR QUANTUM WELLS;

EID: 0033691468     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(00)00158-5     Document Type: Article

References (14)

1. Leonardi K., Selke H., Heinke H., Ohkawa K., Hommel D., Gindele F., Woggon U. J. Crystal Growth. 184/185:1998;259.
2. Rosenauer A., Reisinger T., Steinkirchner E., Zweck J., Gebhardt W. J. Crystal Growth. 152:1995;42.
3. Strassburg M., Kutzer V., Pohl U.W., Hoffmann A., Broser I., Ledentsov N.N., Bimberg D., Rosenauer A., Fischer U., Gerthsen D., Krestnikov I.L., Maximov M.V., Kop'ev P.S. Zh. I. Alferov, Appl. Phys. Lett. 72:1998;942.
4. Kyutt R.N., Toropov A.A., Sorokin S.V., Shubina T.V., Ivanov S.V., Karlsteen M., Willander M. Appl. Phys. Lett. 75:1999;373.
5. Chinyama K.G., O'Donnell K.P., Rosenauer A., Gerthsen D. J. Crystal Growth. 203:1999;362.
6. Fleming R.M., McWahn D.R., Gossard A.C., Wiegmann W., Logan R.A. J. Appl. Phys. 51:1980;357.
7. Fatah J.M., Harrison P., Stirner T., Hogg J.H.C., Hagston W.E. J. Appl. Phys. 83:1998;4037.
8. Rosenauer A., Kaiser S., Reisinger T., Zweck J., Gebhardt W., Gerthsen D. Optik. 102:1996;63.
9. Tapfer L., Ploog K. Phys. Rev. B. 40:1989;9802.
10. Bocchi C., Ferrari C. J. Phys. D: Appl. Phys. 28:1995;A164.
11. Passow T., Leonardi K., Stockmann A., Selke H., Heinke H., Hommel D. J. Phys. D: Appl. Phys. 32:1999;A42.
12. T. Passow, H. Heinke, D. Hommel, J. Falta, T. Schmidt, in preparation.
13. Rosenauer A., Remmerle T., Gerthsen D., Tillmann K., Förster A. Optik. 105:1997;99.
14. Muraki K., Fukatsu S., Shiraki Y., Ito R. Appl. Phys. Lett. 61:1992;557.