Double crystal x-ray diffraction simulations of diffusion in semiconductor microstructures

Journal of Applied Physics

Volumn 83, Issue 8, 1998, Pages 4037-4041

  Fatah, J M ^a   Harrison, P ^a,b   Stirner, T ^a   Hogg, J H C ^a   Hagston, W E ^a  

^a UNIVERSITY OF HULL   (United Kingdom)

^b UNIVERSITY OF LEEDS   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0041475668     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.367159     Document Type: Article

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