The influence of the deposition angle on the composition of reactively sputtered thin films

Surface and Coatings Technology

Volumn 94-95, Issue , 1997, Pages 242-246

  Nyberg, T ^a   Nender, C ^a   Hogberg H ^a   Berg, S ^a  

^a UPPSALA UNIVERSITY   (Sweden)

Author keywords

Deposition angle; Film composition; Reactively sputtered thin films

Indexed keywords

COMPOSITION EFFECTS; COMPUTER SIMULATION; SPUTTER DEPOSITION; STOICHIOMETRY; SUBSTRATES; THIN FILMS;

DEPOSITION ANGLE;

PROTECTIVE COATINGS;

EID: 0031250780     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(97)00340-X     Document Type: Article

References (8)

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