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Volumn , Issue 21, 1999, Pages 2229-2230

A self-assembled monolayer of a fluorescent guest for the screening of host molecules

Author keywords

[No Author keywords available]

Indexed keywords

BETA CYCLODEXTRIN; DANSYL CHLORIDE;

EID: 0033533948     PISSN: 13597345     EISSN: None     Source Type: Journal    
DOI: 10.1039/a906563f     Document Type: Article
Times cited : (65)

References (19)
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    • ed. J. L. Atwood, J. E. D. Davies, D. D. MacNicol and F. Vögtle, Pergamon, Oxford
    • Comprehensive Supramolecular Chemistry, ed. J. L. Atwood, J. E. D. Davies, D. D. MacNicol and F. Vögtle, Pergamon, Oxford, 1996.
    • (1996) Comprehensive Supramolecular Chemistry
  • 3
    • 2842605870 scopus 로고    scopus 로고
    • P. Timmerman and D. N. Reinhoudt, Adv. Mater., 1999, 11, 71; W. C. Still, Acc. Chem. Res., 1996, 29, 155.
    • (1996) Acc. Chem. Res. , vol.29 , pp. 155
    • Still, W.C.1
  • 4
    • 0001614619 scopus 로고    scopus 로고
    • R. C. Sabapathy, S. Bhattachatyya, W. E. Cleland, Jr. and C. L. Hussey, Langmuir, 1998, 14, 3797; H. Ju and D. Leech, Langmuir, 1998, 14, 300; L. Zhang, L. A. Godinez, T. Lu, G. W. Gokel and A. E. Kaifer, Angew. Chem., Int. Ed. Engl., 1995, 34, 235.
    • (1998) Langmuir , vol.14 , pp. 3797
    • Sabapathy, R.C.1    Bhattachatyya, S.2    Cleland W.E., Jr.3    Hussey, C.L.4
  • 5
    • 0031647902 scopus 로고    scopus 로고
    • R. C. Sabapathy, S. Bhattachatyya, W. E. Cleland, Jr. and C. L. Hussey, Langmuir, 1998, 14, 3797; H. Ju and D. Leech, Langmuir, 1998, 14, 300; L. Zhang, L. A. Godinez, T. Lu, G. W. Gokel and A. E. Kaifer, Angew. Chem., Int. Ed. Engl., 1995, 34, 235.
    • (1998) Langmuir , vol.14 , pp. 300
    • Ju, H.1    Leech, D.2
  • 10
    • 0344371854 scopus 로고    scopus 로고
    • 3
    • 3.
  • 11
    • 0344371853 scopus 로고    scopus 로고
    • Ellipsometry was performed on a Plasmos Ellipsometer (λ = 633 nm) assuming a refractive index of 1.46 for the monolayer and the underlying oxide. The thickness of the silicon oxide layer was measured separately on an unmodified part of the same wafer and subtracted from the total layer thickness determined for the monolayer covered silicon substrate
    • Ellipsometry was performed on a Plasmos Ellipsometer (λ = 633 nm) assuming a refractive index of 1.46 for the monolayer and the underlying oxide. The thickness of the silicon oxide layer was measured separately on an unmodified part of the same wafer and subtracted from the total layer thickness determined for the monolayer covered silicon substrate.
  • 13
    • 0345666533 scopus 로고    scopus 로고
    • Absorption measurements were performed on a Hewlett Packard 8452A Diode Array Spectrophotometer. The quartz slides were coated with a SAM on each side of the substrate, so that the presented absorption spectra are due to two monolayers. An unmodified quartz slide was used as a blank
    • Absorption measurements were performed on a Hewlett Packard 8452A Diode Array Spectrophotometer. The quartz slides were coated with a SAM on each side of the substrate, so that the presented absorption spectra are due to two monolayers. An unmodified quartz slide was used as a blank.
  • 15
    • 0344371852 scopus 로고    scopus 로고
    • Fluorescence emission and excitation spectra were measured with a SLM Instruments SPF-500C spectrofluorometer. The presented emission spectra were recorded after excitation at 350 nm with excitation and emission bandwidths of 7.5 nm
    • Fluorescence emission and excitation spectra were measured with a SLM Instruments SPF-500C spectrofluorometer. The presented emission spectra were recorded after excitation at 350 nm with excitation and emission bandwidths of 7.5 nm.


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