Microanalysis of masklessly fabricated micro structures using nuclear microprobe

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 136-138, Issue , 1998, Pages 373-378

  Park, Y K ^a   Takai, M ^a   Nagai, T ^a   Kishimoto, T ^a   Seidl, A ^b   Lehrer, C ^c   Frey, L ^c   Ryssel, H ^c  

^a OSAKA UNIVERSITY   (Japan)

^b Fachhochschule Magdeburg   (Germany)

^c FRAUNHOFER INSTITUTE FOR INTEGRATED CIRCUITS IIS   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

BERYLLIUM; ETCHING; INTEGRATED CIRCUIT MANUFACTURE; ION BEAM LITHOGRAPHY; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SEMICONDUCTING GALLIUM;

FOCUSED ION BEAMS (FIB); MASKLESSLY FABRICATED MICROSTRUCTURES; NUCLEAR MICROPROBE;

NUCLEAR INSTRUMENTATION;

EID: 0032020673     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(97)00709-X     Document Type: Article

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