Operating high-density plasma sources in a low-density range: Applications to metal etch processes

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 17, Issue 5, 1999, Pages 2572-2580

  Czuprynski, P ^a,b   Joubert, O ^a,b   Vallier, L ^a,b   Sadeghi, N ^c  

^a ORANGE LABS   (France)

^b CEA LETI   (France)

^c UNIV GRENOBLE ALPES   (France)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033438541     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581998     Document Type: Article

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