Synthesis of silicon carbonitride thin films by means of r.f.-sputtering and ion implantation

Surface and Coatings Technology

Volumn 116-119, Issue , 1999, Pages 419-423

  Lutz, H ^a   Bruns, M ^a   Link, F ^b   Baumann, H ^b  

^a KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

^b GOETHE UNIVERSITY   (Germany)

Author keywords

AES; Ion implantation; N RBS; NRA; R.f. magnetron co sputtering; Si C N thin films; XPS

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; ION IMPLANTATION; MAGNETRON SPUTTERING; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICON; SILICON COMPOUNDS; SYNTHESIS (CHEMICAL); THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

NUCLEAR REACTION ANALYSIS (NRA); SILICON CARBONITRIDE;

INORGANIC COATINGS;

CERAMIC COATING; ION IMPLANTATION; SPUTTERING;

EID: 0033392432     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(99)00311-4     Document Type: Conference Paper

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