Production and surface analytical characterization of various chalcogenide glass thin films for analytical microdevices

Surface and Coatings Technology

Volumn 97, Issue 1-3, 1997, Pages 707-712

  Bruns, M ^a   Klewe Nebenius, H ^a   Pfennig, G ^a   Bychkov, E ^a,b   Ache, H J ^a  

^a KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

^b UNIV MONTPELLIER   (France)

Author keywords

AsSeCu thin films; Cu2+ microsensor; RF magnetron co sputtering; XPS, AES, RBS

Indexed keywords

ARSENIC COMPOUNDS; AUGER ELECTRON SPECTROSCOPY; MAGNETRON SPUTTERING; METALLIC GLASS; POTENTIOMETRIC SENSORS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; STOICHIOMETRY; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

LIQUID MEDIA BULK CHALCOGENIDE GLASS; RADIO FREQUENCY MAGNETRON CO SPUTTERING;

PROTECTIVE COATINGS;

EID: 0031383896     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(97)00334-4     Document Type: Article

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