Extraction of sheet resistance from four-terminal sheet resistors replicated in monocrystalline films with nonplanar geometries

IEEE Transactions on Semiconductor Manufacturing

Volumn 12, Issue 2, 1999, Pages 154-165

  Cresswell, Michael W ^a,b   Guillaume, Nadine M P ^b,c   Lee, William E ^d   Allen, Richard A ^a,b   Guthrie, William F ^b   Ghoshtagore, Rathindra N ^a,b   Osborne, Zoe E ^e   Sullivan, Neal ^f   Linholm, Loren W ^a,b  

^a IEEE

^b NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^c Ecl Natl Sup d'Electrotechnique d'Electronique d'Informatique et d'Hydraulique de Toulouse   (France)

^d RENISHAW PLC   (United Kingdom)

^e APPLIED MATERIALS INC   (United States)

^f SCHLUMBERGER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALGORITHMS; CRYSTALLINE MATERIALS; ELECTRIC RESISTANCE; FINITE ELEMENT METHOD; LITHOGRAPHY; MEASUREMENT ERRORS; RESISTORS; SEMICONDUCTING FILMS; SEMICONDUCTOR DEVICE STRUCTURES;

CURRENT FLOW ANALYSIS; MONOCRYSTALLINE FILMS; SHEET RESISTANCE; SHEET RESISTOR;

SILICON ON INSULATOR TECHNOLOGY;

EID: 0033363408     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/66.762872     Document Type: Article

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