Electrical linewidth test structures fabricated in mono-crystalline films for reference-material applications

IEEE International Conference on Microelectronic Test Structures

Volumn , Issue , 1997, Pages 16-24

  Cresswell, Michael W ^a   Sniegowski, Jeffry J ^a   Ghoshtagore, Rathindra N ^a   Allen, Richard A ^a   Guthrie, William F ^a   Linholm, Loren W ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CALIBRATION; CRYSTAL ORIENTATION; ELECTRIC VARIABLES MEASUREMENT; SEMICONDUCTING SILICON; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DEVICE STRUCTURES; SEMICONDUCTOR DEVICE TESTING; SILICA; THIN FILMS;

CRITICAL DIMENSION (CD) INSTRUMENT CALIBRATION; SEPARATION BY THE IMPLANTATION OF OXYGEN (SIMOX) TECHNOLOGY;

SEMICONDUCTING FILMS;

EID: 0030712549     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (17)