Study of thermal stability of CVD Ta2O5/Si interface

Materials Research Society Symposium - Proceedings

Volumn 567, Issue , 1999, Pages 473-479

  Mao, A Y ^a   Son, K A ^b   White, J M ^a   Kwong, D L ^a   Roberts, D A ^b   Vrtis Schumacher, R N ^a  

^a UNIVERSITY OF TEXAS AT AUSTIN   (United States)

^b AIR PRODUCTS AND CHEMICALS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CHEMICAL VAPOR DEPOSITION; INTERFACES (MATERIALS); NITRIDING; SECONDARY ION MASS SPECTROMETRY; SEMICONDUCTING SILICON; SUBSTRATES; TANTALUM COMPOUNDS; TEMPERATURE PROGRAMMED DESORPTION; THERMODYNAMIC STABILITY; VACUUM APPLICATIONS; X RAY PHOTOELECTRON SPECTROSCOPY;

INERT GAS ANNEALING; TANTALUM PENTOXIDE FILM;

DIELECTRIC FILMS;

EID: 0033356941     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (16)

1. H. Shinriki, T. Kisu, S. Kimura et al., IEEE Trans. Electron Devices 37 (9), 1939 (1990).
2. R F. Luan, B. Y. Kim, R. N. Vrtis, D. A. Roberts, IEEE IEDM Tech. Digest, 609 (1998).
3. W. S. Lau, p. W. Qian, N. P. Sandier et al., Jpn. J. Appl. Phys. 36, 661 (1997).
4. S. C. Sun and T. F. Chen, IEDM, 687 (1996).
5. H. Shinriki and M. Nakata, IEEE Transactions on Electron Devices 38, 455 (1991).
6. E. P. Burte and N. Rausch, Journal of Non-Crystalline Solids 187, 425 (1995).
7. S. Kamiyama, T. Saeki, H. Mon et al., IEEE IEDM Technical Digest, 827 (1991).
8. S. W. Park, Y. K. Baek, J. Y. Lee et al., Journal of Electronic Materials 21, 635 (1992).
9. K.-A. Son, A. Y. Mao, Y. -M. Sun et al., Appl. Phys. Lett. 72 (10), 1187-1189 (1998).
10. J. F. Moulder, W. F. Stickle, p. E. Sobol et al., Handbook of X-ray Photoelectron Spectroscopy (Physical Electronics, Inc., Eden Prairie, Minnesota, 1995).
11. 7/2 at 27 eV compared to 26.9 eV in our work [Fig. 1(a)].
12. K.-A. Son, A. Y. Mao, B. Y. Kim et al., J. Vac. Sci. Technol. A 16 (3), 1670-1675 (1998).
13. F.W. Walker, J.R. Parrington, and F. Feiner, Nudides and Isotopes, Fourteenth Ed. ed. (General Electric Company, San Jose, CA, 1989).
14. Y.-K. Sun, D. J. Bonser, and Thomas Engel, J. Vac. Sci. Technol. A 10 (4), 2314-2321 (1992).
15. U. Johansson, H. Zhang, and R. Nyholm, Journal of Electron Spectroscopy and Related Phenomena 84, 45-52 (1997).
16. K.-A. Son, A. Y. Mao, D. A. Hess et al., Electrochemical and Solid-State Letters 1 (4), 178 (1998).