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Volumn 273-274, Issue , 1999, Pages 489-492
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Impurity-assisted annealing of point defect complexes in ion- Implanted silicon
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Author keywords
Annealing; DLTS; Ion implantation; Lattice disorder; Point defects; Silicon
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Indexed keywords
ANNEALING;
CRYSTAL GROWTH FROM MELT;
CRYSTAL LATTICES;
DEEP LEVEL TRANSIENT SPECTROSCOPY;
DISSOCIATION;
ELECTRON IRRADIATION;
ION IMPLANTATION;
POINT DEFECTS;
SEMICONDUCTOR GROWTH;
THERMODYNAMIC STABILITY;
VANADIUM;
VANADIUM COMPOUNDS;
HIGH-ORDER VACANCY CLUSTER;
SEMICONDUCTING SILICON;
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EID: 0033355029
PISSN: 09214526
EISSN: None
Source Type: Journal
DOI: 10.1016/S0921-4526(99)00532-3 Document Type: Article |
Times cited : (4)
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References (13)
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