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Volumn 273-274, Issue , 1999, Pages 489-492

Impurity-assisted annealing of point defect complexes in ion- Implanted silicon

Author keywords

Annealing; DLTS; Ion implantation; Lattice disorder; Point defects; Silicon

Indexed keywords

ANNEALING; CRYSTAL GROWTH FROM MELT; CRYSTAL LATTICES; DEEP LEVEL TRANSIENT SPECTROSCOPY; DISSOCIATION; ELECTRON IRRADIATION; ION IMPLANTATION; POINT DEFECTS; SEMICONDUCTOR GROWTH; THERMODYNAMIC STABILITY; VANADIUM; VANADIUM COMPOUNDS;

EID: 0033355029     PISSN: 09214526     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-4526(99)00532-3     Document Type: Article
Times cited : (4)

References (13)
  • 8
    • 0000542039 scopus 로고
    • N.B. Urli, J.W. Corbett (Eds.), Institute of Physics, Bristol
    • L.C. Kimmerling in: N.B. Urli, J.W. Corbett (Eds.), Radiation Effect in Semiconductor 1976, Institute of Physics, Bristol, 1977 p. 221.
    • (1977) Radiation Effect in Semiconductor 1976 , pp. 221
    • Kimmerling, L.C.1
  • 10
    • 0004233474 scopus 로고
    • J.H. Crawford, L.M. Slifkin (Eds.), Plenum Press, New York
    • J.W. Corbett, J.C. Bourgoin in: J.H. Crawford, L.M. Slifkin (Eds.), Point Defects in Solids Vol. 2, Plenum Press, New York, 1975, p. 27.
    • (1975) Point Defects in Solids , vol.2 , pp. 27
    • Corbett, J.W.1    Bourgoin, J.C.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.