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Volumn 129, Issue 7, 1982, Pages 1588-1592

Low Pressure Deposition of Phosphosilicate Glass Films

Author keywords

CVD; dielectrics; integrated circuits; P glass

Indexed keywords

GLASS; INTEGRATED CIRCUITS;

EID: 0020151690     PISSN: 00134651     EISSN: 19457111     Source Type: Journal    
DOI: 10.1149/1.2124213     Document Type: Article
Times cited : (36)

References (20)
  • 6
    • 0015756624 scopus 로고
    • W. Kern, RCA Rev., 34, 655 (1973).
    • (1973) RCA Rev. , vol.34 , pp. 655
    • Kern, W.1
  • 18
    • 0016624525 scopus 로고
    • Chemical Vapor Deposition
    • Princeton, NJ
    • G. Wahl, in “ Chemical Vapor Deposition, “ J. M.Blocher, Jr., H. R. Hinterman, and L. H. Hall, Editors, p. 391, The Electrochemical Society Softbound Proceedings Series, Princeton, NJ (1975).
    • (1975) The Electrochemical Society Softbound Proceedings Series , pp. 391
    • Wahl, G.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.