Effect of water absorption of dielectric underlayers on crystal orientation in AI-Si-Cu/Ti/TiN/Ti metallization

Journal of Applied Physics

Volumn 81, Issue 10, 1997, Pages 7030-7038

  Yoshida, Tomoyuki ^a   Hashimoto, Shoji ^a   Hosokawa, Hideki ^a   Ohwaki, Takeshi ^a   Mitsushima, Yasuichi ^a   Taga, Yasunori ^a  

^a Rd Management Section   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0006785418     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.365269     Document Type: Article

References (24)

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