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Volumn 46, Issue 6 PART 1, 1999, Pages 1736-1743

The effects of architecture and process on the hardness of programmable technologies

Author keywords

[No Author keywords available]

Indexed keywords

FERROELECTRIC RANDOM ACCESS MEMORY; HIGH ENERGY IONS; PROGRAMMABLE MICROCIRCUITS; SHALLOW TRENCH ISOLATION; SINGLE EVENT LATCHUP;

EID: 0033331369     PISSN: 00189499     EISSN: None     Source Type: Journal    
DOI: 10.1109/23.819147     Document Type: Article
Times cited : (5)

References (7)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.