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Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 38, Issue 11, 1999, Pages 6438-6444

Characterization of dual hollow cathode arc chemical vapor deposition by optical emission spectroscopy

(2) Liang, Gou Tsau a Hong, Franklin Chau Nan a

a Kung University (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

CATHODES; CHEMICAL VAPOR DEPOSITION; ELECTRIC ARCS; ELECTRIC CURRENTS; ELECTRON IRRADIATION; EMISSION SPECTROSCOPY; HALOGENATION; LIGHT EMISSION; METHANE; PLASMAS;

ACTINOMETRY; ELECTRON BOMBARDMENT; OPTICAL EMISSION SPECTROSCOPY (OES);

DIAMOND FILMS;

EID: 0033331305 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/jjap.38.6438 Document Type: Article

Times cited : (2)

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