Enhanced deposition rate of diamond in atmospheric pressure plasma CVD: Effects of a secondary discharge

Diamond and Related Materials

Volumn 6, Issue 2-4, 1997, Pages 202-206

  Baldwin Jr , Scott K ^a   Owano, Thomas G ^b   Zhao, Maosheng ^b   Kruger, Charles H ^b  

^a LAM RESEARCH CORPORATION   (United States)

^b Stanford University   (United States)

Author keywords

Atomic hydrogen; Bias; Growth; Raman spectroscopy

Indexed keywords

EID: 0003843989     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0925-9635(96)00634-6     Document Type: Article

References (9)

1. S.K. Baldwin, Jr., T.G. Owano and C.H. Kruger, Appl. Phys. Lett., 67 (1995) 194.
2. S. Matsumoto, I. Hosoya and T. Chounan, Jpn. J. Appl. Phys., 29 (1990) 2082.
3. S. Okoli, R. Haubner and B. Lux, Diamond Relat. Mater., 1 (1992) 955.
4. S.K. Baldwin, T.G. Owano and C.H. Kruger, Proc. 12th Int. Symp. on Plasma Chemistry, 4, Minneapolis, MN, 1995, p. 2011 (awarded best paper).
5. S.K. Baldwin, Jr., Ph.D. Thesis, Stanford University (1996).
6. L.S.G. Plano, Ph.D. Thesis, Stanford University (1991).
7. M.H. Loh, J.G. Liebeskind and M.A. Cappelli, 30th AIAA/ASME/ SAE/ASEE Joint Propulsion Conf., AIAA 94-3233, Indianapolis, IN, 1994.
8. S.A. Stuart, S. Prawer and P.S. Weiser, Appl. Phys. Lett., 62 (1993) 1227.
9. C.O. Laux, Ph.D. Thesis, Stanford University (1993).