On the optimization of a dc arcjet diamond chemical vapor deposition reactor

Journal of Materials Research

Volumn 11, Issue 3, 1996, Pages 694-702

  Reeve, S W ^a,c   Weimer, W A ^a   Dandy, D S ^b  

^a NAVAL AIR WARFARE CENTER   (United States)

^b Engineering Research Center and Hydraulics Laboratory   (United States)

^c ARKANSAS STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CALCULATIONS; DEPOSITION; FILM GROWTH; FILM PREPARATION; METHANE; PLASMA APPLICATIONS; PLASMA JETS; REACTION KINETICS; SYNTHESIS (CHEMICAL); SYNTHETIC DIAMONDS;

DC ARCJET DEPOSITION REACTOR;

DIAMOND FILMS;

EID: 0030109421     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/JMR.1996.0084     Document Type: Article

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