Suspending highly doped silicon-on-insulator wires for applications in nanomechanics

Nanotechnology

Volumn 10, Issue 4, 1999, Pages 418-420

  Pescini, L ^a   Tilke, A ^a   Blick, R H ^a   Lorenz, H ^a   Kotthaus, J P ^a   Eberhardt, W ^b   Kern, D ^b  

^a UNIVERSITY OF MUNICH   (Germany)

^b UNIVERSITY OF TÜBINGEN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

DRY ETCHING; ELECTRON BEAM LITHOGRAPHY; ELECTRONS; MICROMACHINING; NANOSTRUCTURED MATERIALS; PHONONS; SEMICONDUCTING FILMS; SEMICONDUCTOR DOPING; SILICON ON INSULATOR TECHNOLOGY; SILICON WAFERS; WIRE;

NANOMECHANICS; NANOWIRES;

NANOTECHNOLOGY;

EID: 0033324483     PISSN: 09574484     EISSN: None     Source Type: Journal    
DOI: 10.1088/0957-4484/10/4/310     Document Type: Article

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