Combined thermal and UV growth of thin dielectrics on silicon in an NO environment

Materials Research Society Symposium - Proceedings

Volumn 567, Issue , 1999, Pages 57-63

  Jamet, Philippe ^a   Tanner, Philip ^a   Barry Harrison, H ^a   Dimitrijev, Sima ^a  

^a GRIFFITH UNIVERSITY   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC PROPERTIES; FILM GROWTH; GATES (TRANSISTOR); HIGH TEMPERATURE EFFECTS; IRRADIATION; MIS DEVICES; NITROGEN COMPOUNDS; OXIDES; SEMICONDUCTOR DEVICE MANUFACTURE; THICKNESS MEASUREMENT; THIN FILMS; ULTRAVIOLET RADIATION;

NITRIC OXIDE; OXYNITRIDATION; PHOTODECOMPOSITION TECHNIQUES;

DIELECTRIC FILMS;

EID: 0033312021     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-567-57     Document Type: Conference Paper

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