An investigation of the pulse characteristics on deposition rate of reactively sputtered titanium dioxide films synthesised with a low-frequency modulation of the discharge current

Surface and Coatings Technology

Volumn 94-95, Issue , 1997, Pages 339-344

  Perry, F ^a   Billard, A ^a   Frantz, C ^a  

^a INSTITUT JEAN LAMOUR   (France)

Author keywords

High rate deposition; Low frequency modulation; Reactive magnetron sputtering; Titanium dioxide

Indexed keywords

CERAMIC COATINGS; ELECTRIC CURRENTS; ELECTRIC DISCHARGES; MAGNETRON SPUTTERING; OXIDATION; STOICHIOMETRY; SYNTHESIS (CHEMICAL);

DEOXIDATION; PULSE CHARACTERISTICS;

TITANIUM DIOXIDE;

EID: 17144444214     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(97)00457-X     Document Type: Article

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