Shallow dopant implant profiles prediction in silicon using efficient molecular dynamics computer schemes

Journal of the Korean Physical Society

Volumn 35, Issue SUPPL. 4, 1999, Pages

  Kang, Jeong Won ^a   Hwang, Ho Jung ^a   Son, Myung Sik ^b  

^a Chung Ang University   (South Korea)

^b Semyung University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033266939     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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