Progress toward a 30 nm silicon metal-oxide-semiconductor gate technology

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 6, 1999, Pages 3158-3163

  Tennant, D M ^a   Timp, G L ^a   Ocola, L E ^a   Green, M ^a   Sorsch, T ^a   Kornblit, A ^a   Klemens, F ^a   Kleiman, R ^a   Kim, Y ^a   Timp, W ^b  

^a LUCENT TECHNOLOGIES   (United States)

^b UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033260768     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590972     Document Type: Article

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