A Continuum Model of DC and RF Discharges

IEEE Transactions on Plasma Science

Volumn 14, Issue 2, 1986, Pages 78-91

  Graves, David B ^a   Jensen, Klavs F ^a  

^a UNIVERSITY OF MINNESOTA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRONS; FILMS - ETCHING; IONS; PLASMAS - APPLICATIONS;

ELECTRONICS MATERIALS PROCESSING; RF DISCHARGES;

ELECTRIC DISCHARGES;

EID: 0022706010     PISSN: 00933813     EISSN: 19399375     Source Type: Journal    
DOI: 10.1109/TPS.1986.4316510     Document Type: Article

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