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Volumn 23, Issue 4, 1995, Pages 717-727

Matching an RF Sheath Model to a Bulk Plasma Model

Author keywords

[No Author keywords available]

Indexed keywords

BOUNDARY CONDITIONS; COMPUTATIONAL METHODS; ELECTRIC DISCHARGES; ELECTRIC IMPEDANCE; ELECTRON CYCLOTRON RESONANCE; ELECTROSTATICS; FLUIDS; IONS; MATHEMATICAL MODELS; PLASMA DENSITY; PLASMA SIMULATION; PLASMA SOURCES;

EID: 0029352781     PISSN: 00933813     EISSN: 19399375     Source Type: Journal    
DOI: 10.1109/27.467994     Document Type: Article
Times cited : (26)

References (33)
  • 1
    • 0022706010 scopus 로고
    • A continuum model of DC and RF discharges
    • June
    • D. B. Graves and K. F. Jensen, “A continuum model of DC and RF discharges,” IEEE Trans. Plasma Sci., vol. 14, pp. 78–91, June 1986.
    • (1986) IEEE Trans. Plasma Sci. , vol.14 , pp. 78-91
    • Graves, D.B.1    Jensen, K.F.2
  • 2
    • 0000044491 scopus 로고
    • Continuum modeling of argon radio frequency glow discharges
    • A. D. Richards, B. E. Thompson, and H. H. Sawin, “Continuum modeling of argon radio frequency glow discharges,” Appl. Phys. Lett., vol. 50, no. 9, pp. 492–494, 1987.
    • (1987) Appl. Phys. Lett. , vol.50 , Issue.9 , pp. 492-494
    • Richards, A.D.1    Thompson, B.E.2    Sawin, H.H.3
  • 3
    • 4243139224 scopus 로고
    • Algorithms for numerical simulation of radio-frequency glow discharges
    • A. P. Paranjpe, J. P. McVittie, and S. A. Self, “Algorithms for numerical simulation of radio-frequency glow discharges,” Phys. Rev. A, vol. 41, no. 12, pp. 6949–6962, 1990.
    • (1990) Phys. Rev. A , vol.41 , Issue.12 , pp. 6949-6962
    • Paranjpe, A.P.1    McVittie, J.P.2    Self, S.A.3
  • 4
    • 36149036895 scopus 로고
    • A two-dimensional, axisymmetric model of a magnetized glow discharge plasma
    • R. K. Porteous, H. M. Wu, and D. B. Graves, “A two-dimensional, axisymmetric model of a magnetized glow discharge plasma,” Plasma Sources Sci. Technol., vol. 3, pp. 25–39, 1994.
    • (1994) Plasma Sources Sci. Technol. , vol.3 , pp. 25-39
    • Porteous, R.K.1    Wu, H.M.2    Graves, D.B.3
  • 5
    • 0001815753 scopus 로고
    • Spatiotemporal characteristics determined by a relaxation continuum model of an inductively coupled plasma
    • K. Kondo, H. Kuroda, and T. Makabe, “Spatiotemporal characteristics determined by a relaxation continuum model of an inductively coupled plasma,” Appl. Phys. Lett., vol. 65, no. 1, pp. 31–33, 1994.
    • (1994) Appl. Phys. Lett. , vol.65 , Issue.1 , pp. 31-33
    • Kondo, K.1    Kuroda, H.2    Makabe, T.3
  • 6
    • 0005683051 scopus 로고
    • Modeling inductively coupled plasmas: The coil current boundary condition
    • B. W. Yu and S. L. Girshick, “Modeling inductively coupled plasmas: The coil current boundary condition,” J. Appl. Phys., vol. 69, no. 2, pp. 656–661, 1991.
    • (1991) J. Appl. Phys. , vol.69 , Issue.2 , pp. 656-661
    • Yu, B.W.1    Girshick, S.L.2
  • 7
    • 0000228239 scopus 로고
    • Two-dimensional hybrid model of inductively coupled plasma sources for etching
    • P. L. G. Ventzek, T. J. Sommerer, R. J. Hoekstra, and M. J. Kushner, “Two-dimensional hybrid model of inductively coupled plasma sources for etching,” Appl. Phys. Lett., vol. 63, no. 11, pp. 605–607, 1993.
    • (1993) Appl. Phys. Lett. , vol.63 , Issue.11 , pp. 605-607
    • Ventzek, P.L.G.1    Sommerer, T.J.2    Hoekstra, R.J.3    Kushner, M.J.4
  • 8
    • 0002202933 scopus 로고
    • Two-dimensional fluid model of high density inductively coupled plasma sources
    • R. A. Stewart, P. Vitello, and D. B. Graves, “Two-dimensional fluid model of high density inductively coupled plasma sources,” J. Vac. Sci. Technol. B, vol. 12, no. 1, pp. 478–485, 1994.
    • (1994) J. Vac. Sci. Technol. B , vol.12 , Issue.1 , pp. 478-485
    • Stewart, R.A.1    Vitello, P.2    Graves, D.B.3
  • 9
    • 0001695234 scopus 로고
    • Temporal evolution of collisionless sheaths
    • M. H. Cho, N. Hershkowitz, and T. Intrator, “Temporal evolution of collisionless sheaths,” J. Vac. Sci. Technol. A, vol. 6, no. 5, pp. 2978–2986, 1988.
    • (1988) J. Vac. Sci. Technol. A , vol.6 , Issue.5 , pp. 2978-2986
    • Cho, M.H.1    Hershkowitz, N.2    Intrator, T.3
  • 10
    • 84951075359 scopus 로고
    • Novel radio-frequency induction plasma processing techniques
    • J. H. Keller, J. C. Forster, and M. S. Barnes, “Novel radio-frequency induction plasma processing techniques,” J. Vac. Sci. Technol. A, vol. 11, no. 5, pp. 2487–2491, 1993.
    • (1993) J. Vac. Sci. Technol. A , vol.11 , Issue.5 , pp. 2487-2491
    • Keller, J.H.1    Forster, J.C.2    Barnes, M.S.3
  • 11
    • 0026203031 scopus 로고
    • Electrical characteristics of parallel plate RF discharges in argon
    • Aug.
    • V. A. Godyak, R. B. Piejak, and B. M. Alexandrovich, “Electrical characteristics of parallel plate RF discharges in argon,” IEEE Trans. Plasma Sci., vol. 19, pp. 660–676, Aug. 1991.
    • (1991) IEEE Trans. Plasma Sci. , vol.19 , pp. 660-676
    • Godyak, V.A.1    Piejak, R.B.2    Alexandrovich, B.M.3
  • 12
    • 36549100807 scopus 로고
    • Plasma potentials of 13.56-MHz RF argon glow discharges in a planar system
    • K. Kohler it et al., “Plasma potentials of 13.56-MHz RF argon glow discharges in a planar system,” J. Appl. Phys., vol. 57, no. 1, pp. 59–66, 1985.
    • (1985) J. Appl. Phys. , vol.57 , Issue.1 , pp. 59-66
    • Kohler it, K.1
  • 13
    • 0000393088 scopus 로고
    • Structured ion energy distribution in radio frequency glow-discharge systems
    • C. Wild and P. Koidl, “Structured ion energy distribution in radio frequency glow-discharge systems,” Appl. Phys. Lett., vol. 54, no. 6, pp. 505–507, 1989.
    • (1989) Appl. Phys. Lett. , vol.54 , Issue.6 , pp. 505-507
    • Wild, C.1    Koidl, P.2
  • 14
    • 34548625667 scopus 로고
    • Measurement of ion impact energy and ion flux at the RFelectrode of a parallel plate reactive ion etcher
    • A. Manenschijn, G. C. A. M. Janssen, E. van der Drift, and S. Radelaar, “Measurement of ion impact energy and ion flux at the RFelectrode of a parallel plate reactive ion etcher,” J. Appl. Phys., vol. 69, no. 3, pp. 1253–1262, 1991.
    • (1991) J. Appl. Phys. , vol.69 , Issue.3 , pp. 1253-1262
    • Manenschijn, A.1    Janssen, G.C.A.M.2    van der Drift, E.3    Radelaar, S.4
  • 15
    • 21344483121 scopus 로고
    • Angular impact energy distributions of argon ions at the powered electrode of a helicon plasma source
    • J. James, “Angular impact energy distributions of argon ions at the powered electrode of a helicon plasma source,” J. Vac. Sci. Technol. A, vol. 12, no. 1, pp. 97–105, 1994.
    • (1994) J. Vac. Sci. Technol. A , vol.12 , Issue.1 , pp. 97-105
    • James, J.1
  • 16
    • 36149018208 scopus 로고
    • A general theory on the plasma of an arc
    • I. Langmuir and L. Tonks, “A general theory on the plasma of an arc,” Phys. Rev., vol. 34, no. 6, pp. 876–924, 1929.
    • (1929) Phys. Rev. , vol.34 , Issue.6 , pp. 876-924
    • Langmuir, I.1    Tonks, L.2
  • 17
    • 0009543901 scopus 로고
    • Asymptotic plasma and sheath representations for low pressure discharges
    • S. A. Self, “Asymptotic plasma and sheath representations for low pressure discharges,” J. Appl. Phys., vol. 36, no. 2, pp. 456–459, 1965.
    • (1965) J. Appl. Phys. , vol.36 , Issue.2 , pp. 456-459
    • Self, S.A.1
  • 18
    • 5544220320 scopus 로고
    • Continuum analysis of the photoionization chamber in the transition from low to high rates of ionization
    • A. B. Wardlaw and I. M. Cohen, “Continuum analysis of the photoionization chamber in the transition from low to high rates of ionization,” Phys. Fluids, vol. 16, no. 5, pp. 637–650, 1973.
    • (1973) Phys. Fluids , vol.16 , Issue.5 , pp. 637-650
    • Wardlaw, A.B.1    Cohen, I.M.2
  • 21
    • 0001027394 scopus 로고
    • Dynamic model of the electrode sheaths in symmetrically driven RFdischarges
    • V. A. Godyak and N. Sternberg, “Dynamic model of the electrode sheaths in symmetrically driven RFdischarges,” Phys. Rev. A, vol. 42, no. 4, pp. 2299–2312, 1990.
    • (1990) Phys. Rev. A , vol.42 , Issue.4 , pp. 2299-2312
    • Godyak, V.A.1    Sternberg, N.2
  • 22
    • 0024131141 scopus 로고
    • Analytical solution for capacitive RF sheath
    • Dec. and “Dynamics of a collisional, capacitive RF sheath,” vol. 17, pp. 338–341, Apr. 1989
    • M. A. Lieberman, “Analytical solution for capacitive RF sheath,” IEEE Trans. Plasma Sci., vol. 16, pp. 638–643, Dec. 1988; and “Dynamics of a collisional, capacitive RF sheath,” vol. 17, pp. 338–341, Apr. 1989.
    • (1988) IEEE Trans. Plasma Sci. , vol.16 , pp. 638-643
    • Lieberman, M.A.1
  • 23
    • 84936902564 scopus 로고    scopus 로고
    • A comparison of particle in cell and fluid model simulations of low pressure radio frequency discharges
    • to appear
    • T. E. Nitschke and D. B. Graves, “A comparison of particle in cell and fluid model simulations of low pressure radio frequency discharges,” J. Appl. Phys., to appear.
    • J. Appl. Phys.
    • Nitschke, T.E.1    Graves, D.B.2
  • 24
    • 36549102085 scopus 로고
    • Frequency dependence of ion bombardment of grounded surfaces in RF argon glow discharges in a planar system
    • K. Kohler, D. E. Home, and J. W. Coburn, “Frequency dependence of ion bombardment of grounded surfaces in RF argon glow discharges in a planar system,” J. Appl. Phys., vol. 58, no. 9, pp. 3350–3355, 1985.
    • (1985) J. Appl. Phys. , vol.58 , Issue.9 , pp. 3350-3355
    • Kohler, K.1    Home, D.E.2    Coburn, J.W.3
  • 25
    • 0026137242 scopus 로고
    • Particle simulations of radio-frequency glow discharges
    • Apr.
    • M. Surendra and D. B. Graves, “Particle simulations of radio-frequency glow discharges,” IEEE Trans. Plasma Sci., vol. 19, pp. 144–157, Apr. 1991.
    • (1991) IEEE Trans. Plasma Sci. , vol.19 , pp. 144-157
    • Surendra, M.1    Graves, D.B.2
  • 26
    • 0020749174 scopus 로고
    • Plasma etch anisotropy—Theory and some verifying experiments relating ion transport, ion energy and etch profiles
    • C. B. Zarowin, “Plasma etch anisotropy—Theory and some verifying experiments relating ion transport, ion energy and etch profiles,” Solid-State Sci. and Technol., vol. 130, no. 5, pp. 1144–1152, 1983.
    • (1983) Solid-State Sci. and Technol. , vol.130 , Issue.5 , pp. 1144-1152
    • Zarowin, C.B.1
  • 27
    • 0038768068 scopus 로고
    • Electronics Research Laboratory, Univ. California, Berkeley, Memo. No. UCB/ERL M87/65
    • M. A. Lieberman, “Basic RF discharge model,” Electronics Research Laboratory, Univ. California, Berkeley, Memo. No. UCB/ERL M87/65, 1988.
    • (1988) “Basic RF discharge model,”
    • Lieberman, M.A.1
  • 28
    • 0001727526 scopus 로고
    • Application of the physics of plasma sheaths to the modeling of RF plasma reactors
    • A. Metze, D. W. Ernie, and H. J. Oskam, “Application of the physics of plasma sheaths to the modeling of RF plasma reactors,” J. Appl. Phys., vol. 60, no. 9, pp. 3081–3087, 1986.
    • (1986) J. Appl. Phys. , vol.60 , Issue.9 , pp. 3081-3087
    • Metze, A.1    Ernie, D.W.2    Oskam, H.J.3
  • 29
    • 0012787931 scopus 로고
    • Modified Bohm criterion for a collisional plasma
    • V. A. Godyak, “Modified Bohm criterion for a collisional plasma,” Phys. Lett., vol. 89A, no. 2, pp. 80–81, 1982.
    • (1982) Phys. Lett. , vol.89 A , Issue.2 , pp. 80-81
    • Godyak, V.A.1
  • 30
    • 0000975851 scopus 로고
    • Two-dimensional modeling of high plasma density inductively coupled sources for materials processing
    • P. L. G. Ventzek, R. J. Hoekstra, and M. J. Kushner, “Two-dimensional modeling of high plasma density inductively coupled sources for materials processing,” J. Vac. Sci. Technol. B, vol. 12, no. 1, pp. 461–477, 1994.
    • (1994) J. Vac. Sci. Technol. B , vol.12 , Issue.1 , pp. 461-477
    • Ventzek, P.L.G.1    Hoekstra, R.J.2    Kushner, M.J.3
  • 32
    • 0004763744 scopus 로고
    • Electron heating by sheaths in radio frequency discharges
    • A. E. Wendt and W. N. G. Hitchon, “Electron heating by sheaths in radio frequency discharges,” J. Appl. Phys., vol. 71, no. 10, pp. 4718–4726, 1992.
    • (1992) J. Appl. Phys. , vol.71 , Issue.10 , pp. 4718-4726
    • Wendt, A.E.1    Hitchon, W.N.G.2
  • 33
    • 0001479410 scopus 로고
    • Collisionless electron heating by radio-frequency plasma sheaths
    • M. Surendra and D. Vender, “Collisionless electron heating by radio-frequency plasma sheaths,” Appl. Phys. Lett., vol. 65, no. 2, pp. 153–155, 1994.
    • (1994) Appl. Phys. Lett. , vol.65 , Issue.2 , pp. 153-155
    • Surendra, M.1    Vender, D.2


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