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Volumn 48, Issue 1, 1999, Pages 283-286

Characteristics of tantalum pentoxide dielectric films deposited on silicon by excimer-lamp assisted photo-induced CVD using an injection liquid source

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; CHEMICAL VAPOR DEPOSITION; CURRENT VOLTAGE CHARACTERISTICS; EXCIMER LASERS; IMPURITIES; LEAKAGE CURRENTS; PERMITTIVITY; POROSITY; SEMICONDUCTING SILICON; TANTALUM COMPOUNDS;

EID: 0033190233     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(99)00389-5     Document Type: Article
Times cited : (5)

References (14)
  • 1
    • 84940826989 scopus 로고
    • (J.L. Vossen and W. Kern eds.) Academic Press, New York
    • K.F. Jensen and W. Kern., Ch IV-1 in Thin Film Processes II, (J.L. Vossen and W. Kern eds.) Academic Press, New York (1991) 283
    • (1991) Ch IV-1 in Thin Film Processes , vol.2 , pp. 283
    • Jensen, K.F.1    Kern, W.2
  • 11
    • 84938019913 scopus 로고
    • June
    • W. Kern, RCA Review (June 1970) 187-206
    • (1970) RCA Review , pp. 187-206
    • Kern, W.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.