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Volumn 48, Issue 1, 1999, Pages 283-286
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Characteristics of tantalum pentoxide dielectric films deposited on silicon by excimer-lamp assisted photo-induced CVD using an injection liquid source
a a a a b b a c a c c |
Author keywords
[No Author keywords available]
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Indexed keywords
CARBON;
CHEMICAL VAPOR DEPOSITION;
CURRENT VOLTAGE CHARACTERISTICS;
EXCIMER LASERS;
IMPURITIES;
LEAKAGE CURRENTS;
PERMITTIVITY;
POROSITY;
SEMICONDUCTING SILICON;
TANTALUM COMPOUNDS;
EXCIMER-LAMP ASSISTED PHOTO-INDUCED CHEMICAL VAPOR DEPOSITION;
ULTRAVIOLET-ASSISTED INJECTION LIQUID SOURCES (UVILS);
DIELECTRIC FILMS;
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EID: 0033190233
PISSN: 01679317
EISSN: None
Source Type: Journal
DOI: 10.1016/S0167-9317(99)00389-5 Document Type: Article |
Times cited : (5)
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References (14)
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