Electron crystallography in surface structure analysis

Microscopy Research and Technique

Volumn 46, Issue 3, 1999, Pages 160-177

  Leslie, C ^a   Landree, E ^a   Collazo Davila, C ^a   Bengu, E ^a   Grozea, D ^a   Marks, L D ^a  

^a Northwestern University   (United States)

Author keywords

Direct methods; Low energy electron diffraction (LEED); Maximum Entropy; Minimum Relative Entropy; Photoelectron holography (PEH); Reflection high energy electron diffraction (RHEED); Surface structure; Transmission electron diffraction (TED); Transmission electron microscopy (TEM)

Indexed keywords

ELECTRON ENERGY LEVELS; ELECTRONS; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; MAXIMUM ENTROPY METHODS; PHOTOELECTRON SPECTROSCOPY; SURFACE STRUCTURE;

DIRECT METHOD; LOW ENERGY ELECTRON DIFFRACTION; LOW-ENERGY ELECTRON DIFFRACTION; MAXIMUM-ENTROPY; MINIMUM RELATIVE ENTROPY; PHOTOELECTRON HOLOGRAPHIES; PHOTOELECTRON HOLOGRAPHY; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; REFLECTION HIGH-ENERGY ELECTRON DIFFRACTION; TRANSMISSION ELECTRON DIFFRACTION; TRANSMISSION ELECTRON MICROSCOPY;

LOW ENERGY ELECTRON DIFFRACTION;

ARTICLE; CRYSTAL STRUCTURE; CRYSTALLOGRAPHY; ELECTRON DIFFRACTION; HOLOGRAPHY; INTERMETHOD COMPARISON; PRIORITY JOURNAL; STATISTICAL MODEL; STRUCTURE ANALYSIS; SURFACE PROPERTY; TRANSMISSION ELECTRON MICROSCOPY;

EID: 0033179222     PISSN: 1059910X     EISSN: None     Source Type: Journal    
DOI: 10.1002/(sici)1097-0029(19990801)46:3<160::aid-jemt2>3.0.co;2-%23     Document Type: Article

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