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Volumn 19, Issue 3, 1996, Pages 316-321
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Planarization of large area CVD-diamond films using polyimide
a,b,c a,d,e,f,g a a a a |
Author keywords
Chemical Vapor Deposition of Diamond; Microcavities; Multichip Modules; Planarization; Polyimide
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Indexed keywords
ADHESION;
ATOMIC FORCE MICROSCOPY;
BOND STRENGTH (MATERIALS);
CHEMICAL VAPOR DEPOSITION;
CRYSTAL STRUCTURE;
ELECTRONICS PACKAGING;
LIQUIDS;
MICROELECTRONIC PROCESSING;
POLYCRYSTALLINE MATERIALS;
SUBSTRATES;
SURFACE ROUGHNESS;
THERMAL CYCLING;
COLUMNAR STRUCTURE;
PLANARIZATION;
POLYCRYSTALLINE STRUCTURE;
SURFACE PITS;
DIAMOND FILMS;
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EID: 0030246078
PISSN: 10631674
EISSN: None
Source Type: Journal
DOI: None Document Type: Article |
Times cited : (4)
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References (8)
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