The structure of tetrahedral amorphous carbon thin films

Thin Solid Films

Volumn 290-291, Issue , 1996, Pages 317-322

  Silva, S R P ^a   Shi, Xu ^b   Tay, B K ^b   Tan, H S ^b   Scheibe, H J ^c   Chhowalla, M ^d   Milne, W I ^d  

^a UNIVERSITY OF SURREY   (United Kingdom)

^b NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^c FRAUNHOFER INSTITUTE FOR MATERIAL AND BEAM TECHNOLOGY IWS   (Germany)

^d UNIVERSITY OF CAMBRIDGE   (United Kingdom)

Author keywords

Amorphous carbon; Electron energy loss spectroscopy (EELS); Tetrahedral amorphous carbon; Vacuum arc deposition

Indexed keywords

CARBON; CRYSTAL LATTICES; CRYSTAL MICROSTRUCTURE; DEPOSITION; ELECTRON ENERGY LOSS SPECTROSCOPY; ELECTRON MICROSCOPY; FILM GROWTH; GRAPHITE; PULSED LASER APPLICATIONS; THERMAL EFFECTS; THIN FILMS; VACUUM DEPOSITED COATINGS;

FILTERED CATHODIC VACUUM ARC (FCVA) DEPOSITION; PULSED LASER ARC (PLA) DEPOSITION; TETRAHEDRAL AMORPHOUS CARBON; VACUUM ARC DEPOSITION;

AMORPHOUS FILMS;

EID: 0030421338     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(96)09182-1     Document Type: Article

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