Microfabricated double layer octupoles for microcolumn applications

Microelectronic Engineering

Volumn 46, Issue 1, 1999, Pages 401-404

  Stebler, C ^a   Pfeffer, T ^a   Staufer, U ^a   De Rooij, N F ^a  

^a UNIVERSITY OF NEUCHÂTEL   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAMS; IMAGE QUALITY; REACTIVE ION ETCHING;

MICROFABRICATED OCTUPOLES;

MICROELECTRONIC PROCESSING;

EID: 0033132510     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(99)00118-5     Document Type: Article

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