The electrostatic moving objective lens and optimized deflection systems for microcolumns

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 6, 1996, Pages 3802-3807

  Thomson, M G R ^a  

^a IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001207242     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.588671     Document Type: Article

References (7)

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2. D. P. Kern, J. Vac. Sci. Technol. 16, 1686 (1979).
3. H. Ohiwa, E. Goto, and A. Ono, Electron. Commun. Jpn. 54-B, 44 (1971).
4. P. W. Hawkes and E. Kasper, Principles of Electron Optics (Academic, New York, 1989), Vol. 2, See. 40.3.
5. M. G. R. Thomson and T. H. P. Chang, J. Vac. Sci. Technol. B 13, 2445 (1995).
6. M. G. R. Thomson, J. Vac. Sci. Technol. B 12, 3498 (1994).
7. The EMECH, EDEF, and ABER_E packages obtained from Munro's Electron Beam Software Ltd.