Optimal design of a high pressure organometallic chemical vapor deposition reactor

Mathematical and Computer Modelling

Volumn 29, Issue 8, 1999, Pages 65-80

  Bachmann, K J ^a   Banks, H T ^a   Hopfner C ^b   Kepler, G M ^a   Lesure, S ^a   McCall, S D ^a   Scroggs, J S ^a  

^a NORTH CAROLINA STATE UNIVERSITY   (United States)

^b SPIRE CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033120198     PISSN: 08957177     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0895-7177(99)00071-0     Document Type: Article

References (17)

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