Heteroepitaxial processes at low and elevated pressures

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3123, Issue , 1997, Pages 64-74

  Bachmann, Klaus J ^a,b   Kepler, Grace M ^a  

^a NORTH CAROLINA STATE UNIVERSITY   (United States)

^b North Carolina State University   (United States)

Author keywords

High pressure chemical vapor deposition; Reactor design; Real time optical process monitoring

Indexed keywords

EPITAXIAL GROWTH; EXTRACTIVE METALLURGY; GRAVITATION; GRAVITATIONAL EFFECTS; HIGH PRESSURE ENGINEERING; HIGH PRESSURE LIQUID CHROMATOGRAPHY; MATERIALS PROPERTIES; MATERIALS SCIENCE; PROCESS CONTROL; PROCESS ENGINEERING; PROCESS MONITORING; TURBULENCE; VAPORS;

CHEMICAL KINETICS; CHEMICAL VAPORS; DENSITY FLUCTUATIONS; DENSITY GRADIENTS; DESIGN CRITERION; ELEVATED PRESSURES; HETERO-EPITAXY; HETEROEPITAXIAL; HIGH PRESSURE (HP); HIGH PRESSURE CHEMICAL VAPOR DEPOSITION; MODERATE PRESSURES; PHASE FRONTS; PRESSURE RANGES; REACTOR DESIGN; REAL-TIME OPTICAL PROCESS MONITORING; REFLECTANCE SPECTROSCOPY (RS); SUBSTRATE WAFERS; VAPOR PHASE;

CHEMICAL VAPOR DEPOSITION;

EID: 0343546122     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.277707     Document Type: Conference Paper

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