Effect of a deprotection group on acrylic photoresist

Journal of Polymer Research

Volumn 6, Issue 2, 1999, Pages 99-105

  Fu, S C ^a   Hsieh, K H ^a   Wang, L A ^a  

^a NATIONAL TAIWAN UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ALCOHOLS; COPOLYMERS; EXCIMER LASERS; HYDROPHOBICITY; PHOTORESISTS; POLARIZATION; POLYACRYLATES;

CHEMICALLY AMPLIFIED PHOTORESISTS (CAMP); DISSOLUTION INHIBITORS (DI); PHOTOACID GENERATORS (PAG); POST EXPOSURE BAKE (PEB); SINGLE LAYER RESISTS (SLR);

PLASTIC COATINGS;

EID: 0033108468     PISSN: 10229760     EISSN: None     Source Type: Journal    
DOI: 10.1007/s10965-006-0076-1     Document Type: Article

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