Deblocking reaction of chemically amplified ArF positive resists

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3333, Issue , 1998, Pages 32-42

  Yamana, Mitsuharu ^a   Itani, Toshiro ^a   Yoshino, Hiroshi ^a   Hashimoto, Shuichi ^a   Tanabe, Hiroyoshi ^a   Kasama, Kunihiko ^a  

^a NEC CORPORATION   (Japan)

Author keywords

Chemically amplified ArF positive resists; Deblocking reaction; DUV lithography; PEB sensitivity; PED stability

Indexed keywords

ACIDS; ARRHENIUS PLOTS; COPOLYMERIZATION; EQUILIBRIUM CONSTANTS; POLYACRYLATES; POLYMERS; RATE CONSTANTS; STABILITY; SUGAR (SUCROSE);

CHEMICALLY AMPLIFIED ARF POSITIVE RESISTS; DEBLOCKING REACTION; DUV LITHOGRAPHY; PEB SENSITIVITY; PED STABILITY;

PLASTIC PRODUCTS;

EID: 0037676351     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.312429     Document Type: Conference Paper

References (13)

1. S. Takechi, M. Takahashi, A. Kotachi, K. Nozaki, E. Yano, and I. Hanyu, J. Photopolym. Sci. Technol., 9, 475(1996).
2. K. Nakano. K. Maeda, S. Iwasa, J. Yano, Y. Ogura, and E. Hasegawa, Proc. SPIE, 2195, 194(1994).
3. R. D. Allen, G. M. Wallraf, R. A. DiPietro, D. C. Hofer, and R. R. Kunz, Proc. SPIE, 2438, 474(1995).
4. N. Shida, T. Ushirogouchi, K. Asakawa, and M. Nakase, J. Photopolym. Sci. Technol., 9, 457(1996).
5. F. M. Houlihan, T. Wallow, A. Timko, E. Nerita, R. Hutton, R. Cirelli, O. Nalamasu, and E. Reichmanis, Proc. SPIE, 3049, 84(1997).
6. M. Yamana, T. Itani, H. Yoshino, S. Hashimoto, N. Samoto, and K. Kasama, Proc. SPIE 3049, 269(1997).
7. K. Maeda, K. Nakano, S. Iwasa, and E. Hasegawa, Proc. SPIE 3049, 55(1997).
8. K. Maeda, K. Nakano, S. Iwasa, T. Ohfuji, and E. Hasegawa, Proc. SPIE 2438, 433(1995).
9. S. Hashimoto, T. Itani, M. Yamana, N. Samoto, and K. Kasama, J. Photopolym. Sci. Technol., 9(4), 591(1996).
10. T. Hattori, L. Schlegel, A. Imai, N. Hayashi, and T. Ueno, Proc. SPIE 1925, 146(1993).
11. J. Petersen, C. Mack, J. Thackeray, R. Sinta, T. Fedynshyn, J. Mori, J. Byers, and D. Miller, Proc. SPIE 2438, 153(1995).
12. J. Petersen, C. Mack, J. Sturtevant, J. Byers, and D. Miller, Proc. SPIE 2438, 167(1995).
13. R. Ferguson, C. Spence, E. Reichmanis, L. Thompson, and A. Neureuther, Proc. SPIE 1262, 412(1990).