Metallurgical Techniques for More Reliable Integrated Circuits

JOM

Volumn 51, Issue 3, 1999, Pages 16-18

  Kang, S H ^a,b   Morris Jr , J W ^c   Oates, A S ^c  

^a NOKIA RESEARCH CENTER   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

^c NONE

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL MICROSTRUCTURE; DIFFUSION IN SOLIDS; ELECTROMIGRATION; METALLURGY; MICROELECTRONICS;

METALLIC CONTACTS;

INTEGRATED CIRCUIT MANUFACTURE;

EID: 0033100126     PISSN: 10474838     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11837-999-0021-y     Document Type: Article

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