Reaction mechanisms in both a CHF3/O2/Ar and CHF3/H2/Ar radio frequency plasma environment

Industrial and Engineering Chemistry Research

Volumn 38, Issue 9, 1999, Pages 3199-3210

  Wang, Ya Fen ^a   Lee, Wen Jhy ^a   Chen, Chuh Yung ^a   Hsieh, Lien Te ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; COMPOSITION EFFECTS; DECOMPOSITION; HYDROGEN; MATHEMATICAL MODELS; OXYGEN; PLASMA APPLICATIONS; PRESSURE EFFECTS; SENSITIVITY ANALYSIS;

TRIFLUOROMETHANE;

FLUORINE COMPOUNDS;

ARGON; CARBON DIOXIDE; FLUOROFORM; HYDROGEN; OXYGEN;

ARTICLE; COMBUSTION; DECOMPOSITION; GAS; PLASMA; RADIOFREQUENCY; REACTION ANALYSIS;

EID: 0032883794     PISSN: 08885885     EISSN: None     Source Type: Journal    
DOI: 10.1021/ie9900519     Document Type: Article

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