In-situ, analytical, high-voltage and high-resolution transmission electron microscopy of Xe ion implantation into Al

Journal of Electron Microscopy

Volumn 48, Issue 5, 1999, Pages 511-518

  Furuya, Kazuo ^a   Mitsuishi, Kazutaka ^a   Song, Minghui ^a   Saito, Tetsuya ^a  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

Author keywords

Cuboctahedron; EELS; Energy filtered image; In situ ion implantation; Structural fluctuation; Xe precipitates

Indexed keywords

CRYSTALLINITY; ELECTRON ENERGY LEVELS; ELECTRON ENERGY LOSS SPECTROSCOPY; ELECTRON SCATTERING; ELECTRONS; ENERGY DISSIPATION; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY;

CUBOCTAHEDRA; ENERGY; ENERGY FILTERED IMAGE; FILTERED IMAGES; HIGH VOLTAGE TRANSMISSION ELECTRON MICROSCOPY; HIGH-RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; IN-SITU ION IMPLANTATIONS; IONS IMPLANTATION; STRUCTURAL FLUCTUATIONS; XE PRECIPITATE;

ION IMPLANTATION;

EID: 0032722681     PISSN: 00220744     EISSN: None     Source Type: Journal    
DOI: 10.1093/oxfordjournals.jmicro.a023709     Document Type: Article

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