The laser exposure requirements of liquid crystal polymer thin films for photomasking applications

Journal of Materials Chemistry

Volumn 7, Issue 10, 1997, Pages 2013-2019

  Goldie, David ^a   Cairns, James ^a   Verrall, Mark ^b   Coates, David ^b  

^a UNIVERSITY OF DUNDEE   (United Kingdom)

^b Merck Sharp & Dohme Limited   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0344096975     PISSN: 09599428     EISSN: None     Source Type: Journal    
DOI: 10.1039/a702841e     Document Type: Article

References (13)

1. S. P. Murarka and M. C. Peckerar, in Electronic Materials - Science and Technology, Academic Press Inc., London, 1989.
2. Side Chain Liquid Crystal Polymers, ed. C. B. McArdle, Blackie, Glasgow and London, 1989.
3. C. Bowry and P. Bonnett, Optical Computing and Processing, 1991, 1, 13.
4. Patent references (date of filing): (a) WO,A,90 10047 (1990);
5. (b) GB,A,2 188 748 (1986);
6. (c) GB,A,2 217 862 (1989);
7. (d) US,A,4 013 466 (1975).
8. C. Bowry, P. Bonnet and M. Clark, Proceedings Eurodisplay 90, Amsterdam, p. 158.
9. D. O'Shea, Elements of Modern Optical Design, John Wiley and Sons Ltd., Chichester, 1985.
10. Handbook of Chemistry and Physics, CRC, 49th edn., section E-8.
11. D. M. Goldie, simulation data, 1995 (unpublished).
12. (a) DWL technical specification, Heidelberg Instruments, Mikrotechnik, Tullastrasse 2, 69126, Heidelberg;
13. (b) Core 2564 Technical Overview, ETEC Systems Inc., 9100 SW Gemini Drive, Beaverton, OR 970015, 1993.