Effect of surface species concentrations and temperature on diamond film morphology in inductively coupled r.f. plasma CVD

Diamond and Related Materials

Volumn 6, Issue 2-4, 1997, Pages 481-485

  Lindsay, J W ^a   Larson, J M ^a   Girshick, S L ^a  

^a University of Minnesota   (United States)

Author keywords

Diamond films; Morphology; Plasma; r.f.

Indexed keywords

EID: 0004840227     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0925-9635(96)00748-0     Document Type: Article

References (16)

1. T.G. Owano, C.H. Kruger, D.S. Green, S. Williams and R.N. Zare, Diamond Relat. Mater., 2 (1993) 661.
2. T.G. Owano, E.H. Wahl and C.H. Kruger, Proc. 8th CIMTEC-World Ceramics Conf. and Forum on New Materials, Florence, Italy, June 29-July 4, 1994.
3. J.W. Lindsay, H. Han and S.L. Girshick, Proc. 12th Intl. Symp. Plasma Chemistry, Minneapolis, August 21-25, 1995, Vol. 4, p. 2023.
4. S.L. Girshick and J.W. Lindsay, MRS Symp. Proc., 416 (1996) 3.
5. S.J. Harris and A.M. Weiner, J. Appl. Phys., 67 (1990) 6520.
6. C.-H. Wu, M.A. Tamor, T.J. Potter and E.W. Kaiser, J. Appl. Phys., 68 (1990) 4825.
7. S.L. Girshick, C. Li, B.W. Yu and H. Han, Plasma Chem. Plasma Process., 13 (1993) 169.
8. S.L. Girshick, B.W. Yu, C. Li and H. Han, Diamond Relat. Mater., 2 (1993) 1090.
9. R. Locher, C. Wild, N. Herres, D. Behr and P. Koidl, Appl. Phys. Lett., 65 (1994) 34.
10. M.T. Bieberich and S.L. Girshick, Plasma Chem. Plasma Process., 16 (1996) 157.
11. MA. Tamor and M.P. Everson, J. Mater. Res., 9 (1994) 1839.
12. J.C. Angus and C.C. Hayman, Science, 241 (1988) 913.
13. C. Wild, R. Kohl, N. Herres, W. Müller-Sebert and P. Koidl, Diamond Relat. Mater., 3 (1994) 373.
14. F. Silva, A. Gicquel, A. Tardieu, P. Cledat and T. Chauveau, Diamond Relat. Mater., 5 (1996) 338.
15. L.N. Krasnoperov, I.J. Kalinovski, H.-N. Chu and D. Gutman, J. Phys. Chem., 97 (1993) 11787.
16. M.C. McMaster, Wen L. Hsu, M.E. Coltrin and D.S. Dandy, J. Appl. Phys., 76 (1994) 7567.