Effects of heat treatments in inert ambients on Si/SiO2 structures

Journal of Non-Crystalline Solids

Volumn 254, Issue 1-3, 1999, Pages 47-56

  Revesz, A G ^a   Hughes, H L ^b  

^a Revesz Associates   (United States)

^b NAVAL RESEARCH LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; ANNEALING; ARGON; CHEMICAL BONDS; COLOR CENTERS; DIELECTRIC FILMS; INTERFACES (MATERIALS); NEON; OXIDATION; SILICA; SILICON WAFERS; SOLUBILITY;

BOND LENGTH;

MOS DEVICES;

EID: 0032684556     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3093(99)00433-0     Document Type: Article

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