Ion implantation-induced nanoscale particle formation in Al2O3 and SiO2 via reduction

Acta Materialia

Volumn 47, Issue 5, 1999, Pages 1497-1511

  Hunt, E M ^a   Hampikian, J M ^b  

^a Technology Laboratory   (United States)

^b Georgia Institute of Technology   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; ION IMPLANTATION; PARTICLE SIZE ANALYSIS; SILICA; SINGLE CRYSTALS;

ION ENERGY;

NANOSTRUCTURED MATERIALS;

EID: 0032679567     PISSN: 13596454     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1359-6454(99)00028-2     Document Type: Article

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