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Journal of Non-Crystalline Solids

Volumn 245, Issue 1-3, 1999, Pages 210-216

Surface morphology of nitrided thin thermal SiO2 studied by atomic force microscopy

(5) Tallarida, Grazia a Cazzaniga, Francesco b Crivelli, Barbara b Zonca, Romina b Alessandri, Mauro b

a LABORATORIO MDM (Italy)

b STMICROELECTRONICS (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; COMPOSITION EFFECTS; HYDROFLUORIC ACID; MORPHOLOGY; NITRIDING; SILICA; SILICON WAFERS; THERMOOXIDATION;

THERMAL ANNEALING;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 0032674815 PISSN: 00223093 EISSN: None Source Type: Journal
DOI: 10.1016/S0022-3093(98)00885-0 Document Type: Article

Times cited : (4)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.